Phase Two Chemicals

Ultra Pure Hydrogen Peroxide

Applications For the Electronics Industry

On-site peroxide

High-Purity Chemistry For Fabs And PV Lines

Phase Two Chemicals enables a revolution — an on-site peroxide generator that lets you produce high-purity hydrogen peroxide on demand, safely, and cost-effectively. That capability maps cleanly to wafer cleaning, backend packaging and thin-film process support, and photovoltaic surface programs where consistency and traceability matter.

Process Fit
Process Fit

Needs only oxygen, electricity, and water; operates at ambient temperature and pressure with real-time monitoring and automatic shutdown on abnormality.

Fab Economics
Fab Economics

Reduces transportation, warehousing, and container recycling costs while keeping predictable on-site supply for high-volume cleaning cycles.

Controlled Output
Controlled Output

Adjusts concentration dynamically (≤2%) with stepless output control and optional IoT for remote monitoring, analytics, and alerts fed to your MES (Manufacturing Execution System).

Operational Discipline
Operational Discipline

Simple, automatic operation with minimal labor supports validated cleaning recipes and shift-to-shift repeatability.

If you are searching for a new oxidant source for wet benches, packaging lines, or PV finishing, we can align generation capacity and analytical checkpoints to your internal release process.

Let's Map Your Strategy

Equipment

Specifications

Representative platform ratings: output ≥300 L per 24 h, hydrogen peroxide concentration ≤2%, power supply AC 200–240 V at 50 Hz, operating power 1.8 kW, footprint 3 m². Values are confirmed during detailed consultation with our team.

Electronics manufacturing and hydrogen peroxide applications overview

Semiconductor

Wafer Cleaning

Acts as an oxidizing agent in processes such as RCA clean, SC-1, and SC-2 to remove organic residues, particles, and metal contaminants, ensuring a clean wafer surface for subsequent deposition and lithography steps.

Semiconductor wafer cleaning with hydrogen peroxide
Surface Readiness
Surface Readiness

Supports controlled removal of organics and particles ahead of critical films.

Recipe Alignment
Recipe Alignment

Pairs with established wet clean sequences where peroxide is the preferred oxidant.

Semiconductor

Advanced Packaging and Thin-Film Processing Support

Supports backend packaging, CMP, and other processes for cleaning and surface performance restoration.

Advanced packaging, CMP, and thin-film process support
Backend Integration
Backend Integration

Supports cleaning and conditioning tasks across packaging and planarization flows.

Material Performance
Material Performance

Maintains stable performance of films and interfaces where contamination control is critical.

Photovoltaic

Front-End Cleaning of PV Cells

Our product creates high-purity hydrogen peroxide solution to clean cell surfaces after texturing and other surface treatments. Ultra pure hydrogen peroxide is used for removing residues, organics, and particulates. This improves overall cell quality.

Photovoltaic cell front-end cleaning and surface treatment
Cell front-end
Cell front-end

Removes residues and particulates after texturing to support higher cell efficiency.

Surface quality
Surface quality

Supports consistent cell quality ahead of downstream processing steps.

Photovoltaic

PV module manufacturing and cell cleaning process

Used in module assembly or PV cell production lines as a high-purity cleaning agent to clean cell surfaces, improving final product efficiency and stability.

PV module manufacturing and cell cleaning on production lines
Module assembly
Module assembly

Integrates with manufacturing lines where high-purity cleaning supports efficiency and stability.

Product performance
Product performance

Helps maintain consistent quality across batch and high-volume PV output.